Spatial effects in the 800keV 3He implantation in W followed by isochronal annealing at 900K - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Année : 2013

Spatial effects in the 800keV 3He implantation in W followed by isochronal annealing at 900K

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hal-01828088 , version 1 (03-07-2018)

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A. de Backer, C. Ortiz, C. Domain, M.F. Barthe, C.S. Becquart. Spatial effects in the 800keV 3He implantation in W followed by isochronal annealing at 900K. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2013, 303, pp.87 - 90. ⟨10.1016/j.nimb.2012.10.025⟩. ⟨hal-01828088⟩
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